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Sub-Half-Micron Lithography for ULSIs

By: Katsumi Suzuki (Edited by) , Shinji Matsui (Edited by) , Yukinori Ochiai (Edited by)

Manufacture on Demand

Ksh 9,650.00

Format: Paperback or Softback

ISBN-10: 0521022347

ISBN-13: 9780521022347

Publisher: Cambridge University Press

Imprint: Cambridge University Press

Country of Manufacture: GB

Country of Publication: GB

Publication Date: Nov 10th, 2005

Publication Status: Active

Product extent: 344 Pages

Weight: 616.00 grams

Dimensions (height x width x thickness): 24.50 x 17.90 x 1.80 cms

Product Classification / Subject(s): Computer science

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This book describes advanced techniques under development in Japan and elsewhere that represent the key to future semiconductor-device fabrication. Several important lithography methods, such as deep UV, X-ray, electron-beam, and focused ion-beam lithography are described in detail by experts. The principles underlying each of the techniques are illustrated at the beginning of each chapter.

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