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Plasma Processes for Semiconductor Fabrication

By: (Author) W. N. G. Hitchon

Manufactured on Demand
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Ksh 12,950.00

Format: Paperback / Softback

ISBN-10: 0521018005

ISBN-13: 9780521018005

Series: Cambridge Studies in Semiconductor Physics and Microelectronic Engineering

Publisher: Cambridge University Press

Imprint: Cambridge University Press

Country of Manufacture: GB

Country of Publication: GB

Publication Date: Sep 29th, 2005

Print length: 232 Pages

Weight: 414 grams

Dimensions (height x width x thickness): 25.40 x 17.80 x 1.40 cms

Product Classification: Semi-conductors & super-conductors

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Self-contained book providing an up-to-date description of plasma etching and deposition in semiconductor fabrication. Presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. Suitable as a graduate-level textbook, and will also be a useful reference for practising engineers in the semiconductor industry.

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